Lo, WS, Chien TS, Fang BS, Wei CM, Mei WN.
1998.
Photoelectron-diffraction studies of Nb(001), Oct. Surface Review and Letters. 5:1035-1041., Number 5
AbstractPhotoelectron-diffraction studies of Nb(001) have been performed to determine the first-interlayer contraction using Mg K alpha radiation (h nu = 1253.6 eV) as an excitation source. Photoemission intensities of the 3d(5/2) core level were measured as a function of the polar angle along several azimuths on the single-crystal surface. The 202.3-eV (205.0-eV) binding energy for the 3d(5/2) (3d(3/2)) core level was well resolved in the photoemission spectra, where the peak intensity could be easily evaluated by curve-fitting processes. Large oscillations of the 3d(5/2) intensity as a function of the polar angle due to forward-focusing were observed. Based on multiple-scattering calculations for several first-interlayer spacings ranging from the bulk value to 16% contraction, the best agreement with experiment was obtained for a (13 +/- 5)% contraction of the first-interlayer spacing.
Hong, S, Chou MY.
1998.
Role of hydrogen in SiH2 adsorption on Si(100), Nov. Physical Review B. 58:13363-13366., Number 20
AbstractWhen disilane (Si2H6) is used in the homoepitaxial growth of Si by chemical vapor deposition (CVD), the fragment SiH2 is believed to be the basic unit adsorbed on the surface. The bonding site of SiH2 on Si(100) has been proposed in the literature to be either on top of a dimer (the on-dimer site) or between two dimers in the same row (the intrarow site). Since the pathway of SiH2 combination is dependent on the adsorption site, a first-principles calculation will shed light on the underlying process. We have performed self-consistent pseudopotential density-functional calculations within the local-density approximation. On the bare Si(100) surface, the on-dimer site is found to be more stable than the intrarow site, even though the former has unfavorable Si-Si bond angles. This is ascribed to the extra dangling bond created in the latter geometry when the weak dimer a bonds are broken. However, the presence of hydrogen adatoms eliminates this difference and makes the intrarow site more favorable than the on-dimer site. It is therefore revealed in this theoretical study that hydrogen, an impurity unavoidable in the CVD process, plays an important role in determining the stable configuration of adsorbed SiH2 on Si(100) and hence affects the growth mechanism. [S0163-1829(98)52544-1].
Lee, E, Puzder A, Chou MY, Uzer T, Farrelly D.
1998.
Pair-tunneling states in semiconductor quantum dots: Ground-state behavior in a magnetic field, May. Physical Review B. 57:12281-12284., Number 19
AbstractUsing classical mechanical and quantum Monte Carlo methods we trace the ground-state behavior with an applied magnetic field of localized electron pair states in a quantum dot. By developing a method to treat nonconserved paramagnetic interactions using variational and diffusion quantum Monte Carlo techniques we find (i) a single-triplet transition at very small magnetic field strengths, (ii) enhanced localization of the two electrons with increasing magnetic field, and (iii) a mechanism for pair breakup that is different from that proposed recently by Wan et al. [Phys. Rev. Lett. 75, 2879 (1995)]. [S0163-1829(98)04016-8].