Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition | Kuei-Hsien Chen

Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Citation:: Chen, KH, Wu JJ, Wen CY, Chen LC, Fan CW, Kuo PF, Chen YF, Huang YS. 1999. Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition. Thin Solid Films. 355-356:205.