@article {1465,
	title = {Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition},
	journal = {Thin Solid Films},
	volume = {355-356},
	year = {1999},
	pages = {205},
	author = {K. H. Chen and J.J. Wu and C.Y. Wen and L. C. Chen and C.W. Fan and P.F. Kuo and Y.F. Chen and Y.S. Huang}
}
