Kuei-Hsien Chen
Advanced Materials Laboratory (AML)
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Effect of dilution gas on SiCN films growth using methylamine
Citation:
Wu, JJ, Chen KH, Wen CY, Chen* LC, Yu Y-C, Wang C-W, Lin E-K. 2001. Effect of dilution gas on SiCN films growth using methylamine. Materials Chemistry and Physics. 72:240-244.
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