Kuei-Hsien Chen

Advanced Materials Laboratory (AML)

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Effect of dilution gas on SiCN films growth using methylamine

Citation:
Wu, JJ, Chen KH, Wen CY, Chen* LC, Yu Y-C, Wang C-W, Lin E-K.  2001.  Effect of dilution gas on SiCN films growth using methylamine. Materials Chemistry and Physics. 72:240-244.
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  • B.Sc. Students (4)
  • M.Sc. Students (3)
  • Ph.D. Students (18)
  • Postdoctoral Researchers (4)
  • Research Assistants (2)

Recent Publications

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