Kuei-Hsien Chen
Advanced Materials Laboratory (AML)
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Methylamine growth of SiCN films using ECR-CVD
Citation:
Wen, CY, Wu JJ, Lo HJ, Chen LC, Chen KH, Lin ST, Yu Y-C, Wang C-W, Lin E-K. 2000. Methylamine growth of SiCN films using ECR-CVD. Mat. Res. Soc. Symp.. :606,115-120.
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