Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor | Kuei-Hsien Chen

Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Citation:: Wu, J-J, Chen KH, Wen C-Y, Chen LC, Yu Y-C, Wang C-W, Lin E-K. 2000. Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor. J. Mater. Chem.. 10:783-787.