Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Citation:
Wu, J-J, Chen KH, Wen C-Y, Chen LC, Yu Y-C, Wang C-W, Lin E-K.  2000.  Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor. J. Mater. Chem.. 10:783-787.