@article {1469,
	title = {Effect of hydrogen addition on SiCN films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor},
	journal = {J. Mater. Chem.},
	volume = {10},
	year = {2000},
	pages = {783-787 },
	author = {J.-J. Wu and K. H. Chen and C.-Y. Wen and L. C. Chen and Y.-C. Yu and C.-W. Wang and E.-K. Lin}
}
