Si-Containing Crystalline Carbon Nitride Derived by Microwave Plasma-Enhanced Chemical Vapor Deposition
- Citation:
- Chen, LC, Bhusari DM, Yang CY, Chen KH, Chuang TJ, Lin MC, Chen CK, Huang YF.
1997. Si-Containing Crystalline Carbon Nitride Derived by Microwave Plasma-Enhanced Chemical Vapor Deposition. Thin Solid Film. 303:66-75.
