Bonding characterization and nano-indentation study of the amorphous SiCxNy films with and without hydrogen incorporation

Citation:
Lo, HC, Wu JJ, Wen CY, Wong TS, Lin ST, Chen* KH, Chen LC.  2001.  Bonding characterization and nano-indentation study of the amorphous SiCxNy films with and without hydrogen incorporation. Diamond Relat. Mater.. 10:1916-1920.