Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2atmosphere

Citation:
Lin, HY, Chen YC, Lin CY, Tong YP, Hwa LG, Chen KH, Chen* LC.  2002.  Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2atmosphere. Thin Solid Films. 416:85-91.