Thermal stability and electronic structure of atomically uniform Pb films on Si(111)
- Citation:
- Upton, M. H., Wei C. M., Chou M. Y., Miller T., & Chiang T. C. (2004). Thermal stability and electronic structure of atomically uniform Pb films on Si(111). Physical Review Letters. 93, 4., Jul, Number 2
Abstract:
Atomically uniform Pb films are successfully prepared on Si(111), despite a large lattice mismatch. Angle-resolved photoemission measurements of the electronic structure show layer-resolved quantum well states which can be correlated with dramatic variations in thermal stability. The odd film thicknesses N=5, 7, and 9 monolayers show sharp quantum well states. The even film thicknesses N=6 and 8 do not, but are much more stable than the odd film thicknesses. This correlation is discussed in terms of a total energy calculation and Friedel-like oscillations in properties.
Notes:
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