<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Miskovsky, N. M.</style></author><author><style face="normal" font="default" size="100%">Wei, C. M.</style></author><author><style face="normal" font="default" size="100%">Tsong, T. T.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">FIELD EVAPORATION OF SILICON IN THE FIELD-ION MICROSCOPE AND SCANNING TUNNELING MICROSCOPE CONFIGURATIONS</style></title><secondary-title><style face="normal" font="default" size="100%">Physical Review Letters</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">HIGH ELECTRIC-FIELDS</style></keyword><keyword><style  face="normal" font="default" size="100%">PENETRATION</style></keyword><keyword><style  face="normal" font="default" size="100%">SEMICONDUCTOR</style></keyword><keyword><style  face="normal" font="default" size="100%">SURFACES</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">1992</style></year><pub-dates><date><style  face="normal" font="default" size="100%">Oct</style></date></pub-dates></dates><urls><web-urls><url><style face="normal" font="default" size="100%">&lt;Go to ISI&gt;://WOS:A1992JT98000030</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">16</style></number><volume><style face="normal" font="default" size="100%">69</style></volume><pages><style face="normal" font="default" size="100%">2427-2430</style></pages><isbn><style face="normal" font="default" size="100%">0031-9007</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;Field evaporation of silicon as positive and negative ions in the field ion microscope and scanning tunneling microscope configurations is investigated with the charge-exchange model using atomic potentials from an empirical potential due to Tersoff [Phys. Rev. B 37, 6991 (1988)] and an environment dependent potential developed by Bolding and Andersen [Phys. Rev. B 41, 10568 (1990)]. For the geometry of the field ion microscope, Si+ should be the observable ion species. In the close-spaced electrode geometry of the scanning tunneling microscope, Si2- should be the favored ion species since it requires the lowest evaporation field.&lt;/p&gt;
</style></abstract><work-type><style face="normal" font="default" size="100%">Article</style></work-type><notes><style face="normal" font="default" size="100%">&lt;p&gt;ISI Document Delivery No.: JT980Times Cited: 39Cited Reference Count: 15Cited References: BOLDING BC, 1990, PHYS REV B, V41, P10568, DOI 10.1103/PhysRevB.41.10568 GOMER R, 1963, J CHEM PHYS, V38, P1613, DOI 10.1063/1.1776932 Jackson J.D., 1962, CLASSICAL ELECTRODYN Kobayashi A., COMMUNICATION LYO IW, 1989, SCIENCE, V245, P1369, DOI 10.1126/science.245.4924.1369 MAMIN HJ, 1990, PHYS REV LETT, V65, P2418, DOI 10.1103/PhysRevLett.65.2418 MISKOVSKY NM, 1992, PHYS REV B, V46, P2640, DOI 10.1103/PhysRevB.46.2640 Muller E. W., 1969, FIELD ION MICROSCOPY STROSCIO JA, 1991, SCIENCE, V254, P1319, DOI 10.1126/science.254.5036.1319 TERSOFF J, 1988, PHYS REV B, V37, P6991, DOI 10.1103/PhysRevB.37.6991 TSONG TT, 1991, PHYS REV B, V44, P13703, DOI 10.1103/PhysRevB.44.13703 TSONG TT, 1979, SURF SCI, V81, P28, DOI 10.1016/0039-6028(79)90503-X Tsong TT, 1990, ATOM PROBE FIELD ION TSONG TT, 1979, SURF SCI, V85, P1, DOI 10.1016/0039-6028(79)90228-0 WANG J, 1991, PHYS REV B, V43, P12571, DOI 10.1103/PhysRevB.43.12571MISKOVSKY, NM WEI, CM TSONG, TTAMERICAN PHYSICAL SOCCOLLEGE PK&lt;/p&gt;
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