<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">C.H. Hsu</style></author><author><style face="normal" font="default" size="100%">H.C. Lo</style></author><author><style face="normal" font="default" size="100%">C.F. Chen</style></author><author><style face="normal" font="default" size="100%">C. T. Wu</style></author><author><style face="normal" font="default" size="100%">J.H. Hwang</style></author><author><style face="normal" font="default" size="100%">D. Das</style></author><author><style face="normal" font="default" size="100%">J. Tsai</style></author><author><style face="normal" font="default" size="100%">L. C. Chen</style></author><author><style face="normal" font="default" size="100%">K.H. Chen*</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Generally applicable self-masked dry etching technique for nanotip arrays formation</style></title><secondary-title><style face="normal" font="default" size="100%">Nano Letters</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2004</style></year></dates><volume><style face="normal" font="default" size="100%">4</style></volume><pages><style face="normal" font="default" size="100%">471-475</style></pages></record></records></xml>